Synthesis of ammonia in a strong electric field discharge at ambient pressure

被引:15
作者
Bai, MD [1 ]
Bai, XY [1 ]
Zhang, ZT [1 ]
Bai, MD [1 ]
机构
[1] Dalian Maritime Univ, Environm Engn Res Inst, Dalian 116026, Liaoning, Peoples R China
关键词
ammonia synthesis; strong electric field discharge; nonequilibrium plasma; ambient pressure; MgO catalyst;
D O I
暂无
中图分类号
TQ [化学工业];
学科分类号
0817 ;
摘要
The plasma synthesis of ammonia has been studied in a nitrogen-hydrogen plasma using a strong electric field discharge at ambient pressure and temperature. With this method, N-2 and H-2 molecules ave ionized and dissociated and a large number of pec atoms, ions, and radicals are formed in a nonequilibrium plasma after inelastic collisions. The final product was mainly ammonia. including a small amount of hydrazine. When MgO powder, used as a catalyst, was smeared on the surface of the electrode plates, the yields of ammonia increased about 1.54-1.75 times and reached 5000 ppm (0.5%; v/v). In this way: plasma synthesis of ammonia at ambient pressure is realized and a new method is provided for inorganic synthesis, which consumes little energy and simplifies the process.
引用
收藏
页码:511 / 520
页数:10
相关论文
共 16 条
  • [1] PRODUCTION OF N, H, AND NH ACTIVE SPECIES IN N-2-H(2) DC FLOWING DISCHARGES
    AMORIM, J
    BARAVIAN, G
    RICARD, A
    [J]. PLASMA CHEMISTRY AND PLASMA PROCESSING, 1995, 15 (04) : 721 - 731
  • [2] BAI MD, 1998, IEEE IAS 32 ANN M NE, P10
  • [3] BAI MD, 1995, CHINESE SCI BULL, V40, P240
  • [4] BAI MD, 1999, J AIR WASTE MANAGE, V49, P174
  • [5] BAI XY, 1993, CHINA ENV SCI, V13, P200
  • [6] MCDANIEL EW, 1964, COLLISION PHENOMENA, P377
  • [7] MILLER TA, 1981, PLASMA CHEM PLASMA P, V1, P13
  • [8] DIRECT SYNTHESIS OF HYDRAZINE OVER METAL-OXIDE CATALYSTS UNDER SILENT DISCHARGE
    MIYAHARA, K
    [J]. CHEMISTRY LETTERS, 1983, (12) : 1871 - 1874
  • [9] ODA T, 1995, P I ELECTROSTAT JPN, V19, P283
  • [10] AMMONIA-SYNTHESIS BY MEANS OF PLASMA OVER MGO CATALYST
    SUGIYAMA, K
    AKAZAWA, K
    OSHIMA, M
    MIURA, H
    MATSUDA, T
    NOMURA, O
    [J]. PLASMA CHEMISTRY AND PLASMA PROCESSING, 1986, 6 (02) : 179 - 193