Effect of yttrium and erbium ions on epitaxial phase transformations in alumina

被引:24
作者
Ragan, DD [1 ]
Mates, T [1 ]
Clarke, DR [1 ]
机构
[1] Univ Calif Santa Barbara, Coll Engn, Dept Mat, Santa Barbara, CA 93160 USA
关键词
THIN-FILMS; OXIDATION; GROWTH; SCALE;
D O I
10.1111/j.1151-2916.2003.tb03338.x
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The effect of low concentrations of Y, Er, and Cr solutes on the amorphous-to-gamma transformation and on the gamma-to-alpha transformation in aluminum oxide has been studied in situ by timeresolved reflectivity. The activation energies of the two transformations with these dopants are the same as in undoped alumina, being 4.1 +/- 0.1 and 5.2 +/- eV, respectively. Although not affecting the activation energies, Y, Er, and Cr do affect the transformation kinetics. Y and Cr ions decrease the gamma-to-alpha transformation velocity and, over the limited range studied, do so in proportion to their concentration. Concentrations of Er as low as similar to6 ppm retard the gamma-to-alpha transformation and concentrations of 32 ppm essentially stop the transformation occurring within the times and temperatures accessible within the present experiment, thereby preventing quantification of the effect of Er on the alpha-phase transformation. Erbium also retards the amorphous-to-gamma transformation relative to undoped alumina whereas yttrium and chromium accelerate it.
引用
收藏
页码:541 / 545
页数:5
相关论文
共 12 条
[1]   THE OXIDATION BEHAVIOR OF NIAL .1. PHASE-TRANSFORMATIONS IN THE ALUMINA SCALE DURING OXIDATION OF NIAL AND NIAL-CR ALLOYS [J].
BRUMM, MW ;
GRABKE, HJ .
CORROSION SCIENCE, 1992, 33 (11) :1677-&
[2]   Role of segregating dopants on the improved creep resistance of aluminum oxide [J].
Cho, J ;
Wang, CM ;
Chan, HM ;
Rickman, JM ;
Harmer, MP .
ACTA MATERIALIA, 1999, 47 (15-16) :4197-4207
[3]  
Clarke DR, 1998, PHYS STATUS SOLIDI A, V166, P183, DOI 10.1002/(SICI)1521-396X(199803)166:1<183::AID-PSSA183>3.0.CO
[4]  
2-R
[5]  
DYNES J, 1986, J AM CERAM SOC, V69, pC195
[6]   Cation segregation in an oxide ceramic with low solubility:: Yttrium doped α-alumina [J].
Gülgün, MA ;
Voytovych, R ;
Maclaren, I ;
Rühle, M ;
Cannon, RM .
INTERFACE SCIENCE, 2002, 10 (01) :99-110
[7]   Lateral growth kinetics of alpha-alumina accompanying the formation of a protective scale on (111)NiAl during oxidation at 1100 degrees C [J].
Lipkin, DM ;
Schaffer, H ;
Adar, F ;
Clarke, DR .
APPLIED PHYSICS LETTERS, 1997, 70 (19) :2550-2552
[8]  
Olson G. L., 1988, Material Science Reports, V3, P1, DOI 10.1016/S0920-2307(88)80005-7
[9]   In situ growth of optically active erbium doped Al2O3 thin films by pulsed laser deposition [J].
Serna, R ;
Afonso, CN .
APPLIED PHYSICS LETTERS, 1996, 69 (11) :1541-1543
[10]   EFFECTIVE IONIC RADII IN OXIDES AND FLUORIDES [J].
SHANNON, RD ;
PREWITT, CT .
ACTA CRYSTALLOGRAPHICA SECTION B-STRUCTURAL CRYSTALLOGRAPHY AND CRYSTAL CHEMISTRY, 1969, B 25 :925-&