Diamond films epitaxially grown by step-flow mode

被引:45
作者
Hayashi, K
Yamanaka, S
Watanabe, H
Sekiguchi, T
Okushi, H
Kajimura, K
机构
[1] Electrotech Lab, Ibaraki, Osaka 305, Japan
[2] Tohoku Univ, Inst Mat Res, Sendai, Miyagi 98077, Japan
关键词
D O I
10.1016/S0022-0248(97)00433-8
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
Homoepitaxial diamond films were grown by the step-Bow mode. The obtained films grown by this mode were characterized using atomic force microscopy, reflection high-energy electron diffraction (RHEED), cathodoluminescence (CL), and junction properties of Al-Schottky contacts. It is found that the surfaces of the films are covered with macroscopic steps running parallel to the [1 1 0] direction. The narrow and streaky RHEED patterns show the surfaces of the films are Bat with 2 x 1 and 1 x 2 double-domain structure. From the CL spectra, strong excitonic luminescence is clearly observed in the temperature range between 120 and 300 K. The absence of the band-A emission in the CL spectra suggests a low density of dislocation in the films. The current-voltage characteristics of Al-Schottky contacts on the as-deposited diamond films show excellent junction properties with the ideality factor of 1.1. These results indicate immense potential for diamond as a semiconducting material. (C) 1998 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:338 / 346
页数:9
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