Advancements in photoinitiators -: Opening up new applications for radiation curing

被引：132

作者：

Dietliker, K.

Huesler, R.

Birbaum, J. -L.

Ilg, S.

Villeneuve, S.

Studer, K.

Jung, T.

Benkhoff, J.

Kura, H.

Matsumoto, A.

Oka, H.

机构：

[1] Ciba Specialty Chem Inc, Coating Effects Segment, CH-4002 Basel, Switzerland

[2] Ciba Specialty Chem KK, Coatings Effects Segment, Amagasaki, Hyogo 6600083, Japan

来源：

PROGRESS IN ORGANIC COATINGS | 2007年 / 58卷 / 2-3期

关键词：

low migration photoinitiators; O-acyloxime photoinitiators; photolatent amines;

D O I：

10.1016/j.porgcoat.2006.08.021

中图分类号：

O69 [应用化学];

学科分类号：

081704 [应用化学];

摘要：

The development of new photoinitiators; which provide additional value to the curing efficiency is reported. These include compounds with low migration and volatility properties avoiding the leaking of chemicals into the environment, initiators that provide a high photosensitivity to black formulations and novel photolatent bases which allow the curing of formulation hitherto not available for radiation curing. These novel photoinitiators expand the use of radiation curing technology into new applications. (C) 2006 Elsevier B.V. All rights reserved.

引用

页码：146 / 157

页数：12

共 48 条

[1]

*ACD LAB, SOFTW SOL V4 67

[2]

BACHON T, 2005, Patent No. 2005100482

[3]

BARTON JM, 1985, ADV POLYM SCI, V72, P111

[4]

BAUDIN G, 2001, Patent No. 200333500