Electroless nickel plating on hollow glass microspheres

被引:91
作者
Zhang, QY [1 ]
Wu, M [1 ]
Zhao, W [1 ]
机构
[1] Northwestern Polytech Univ, Dept Appl Chem, Xian 710072, Peoples R China
关键词
electroless plating; nickel; surface treatment; hollow glass microspheres; magnetic property;
D O I
10.1016/j.surfcoat.2004.06.013
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Electroless nickel plating on hollow glass microspheres with hypophosphite as a reducing agent in an alkaline bath was studied. Three pretreatment methods were used. The hollow glass spheres via coupling agent solution pretreatment adsorbed more palladium catalytic active centers on their surfaces, hence continuously and uniformly covered microspheres were achieved. The magnetic property of microspheres was improved by adjusting the pH and the concentration of the reducing agent in a certain range. The morphology, composition and structure of deposits were investigated. It was found that the deposits on hollow glass microspheres grew thicker with prolonged plating time. Posttreatment of the coated Ni glass spheres improved the crystalline structure of the plated Ni layer. (C) 2004 Elsevier B.V. All rights reserved.
引用
收藏
页码:213 / 219
页数:7
相关论文
共 12 条
[1]   Decoration of activated carbon nanotubes with copper and nickel [J].
Ang, LM ;
Hor, TSA ;
Xu, GQ ;
Tung, CH ;
Zhao, SP ;
Wang, JLS .
CARBON, 2000, 38 (03) :363-372
[2]   Electroless nickel plating on silicon carbide nanoparticles [J].
Chen, YJ ;
Cao, MS ;
Xu, Q ;
Zhu, J .
SURFACE & COATINGS TECHNOLOGY, 2003, 172 (01) :90-94
[3]  
Chung WS, 1996, PLAT SURF FINISH, V83, P68
[4]  
COLARUOTOLO J, 1990, ELECTROLESS PLATING, pCH8
[5]  
CRAIG S, Patent No. 0479438B1
[6]  
DAVIES GE, Patent No. 4177253
[7]   Hardness, friction and wear characteristics of nickel-SiC electroless composite deposits [J].
Grosjean, A ;
Rezrazi, M ;
Takadoum, J ;
Berçot, P .
SURFACE & COATINGS TECHNOLOGY, 2001, 137 (01) :92-96
[8]  
HAGIWARA K, 1997, PLAT SURF FINISH, V84, P76
[9]   Electroless nickel plating for nanofabrication in optics [J].
Kobayashi, T ;
Ishibashi, J ;
Mononobe, S ;
Ohtsu, M ;
Honma, H .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2000, 147 (03) :1046-1049
[10]   Preparation of anisotropic conductive fine particles by electroless nickel plating [J].
Motizuki, I ;
Izawa, K ;
Watanabe, J ;
Honma, H .
TRANSACTIONS OF THE INSTITUTE OF METAL FINISHING, 1999, 77 :41-43