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Photo-patternable gelatin as protection layers in low-temperature surface micromachinings

被引：21
作者：
Yang, LJ
Lin, WZ
Yao, TJ
Tai, YC
机构：
[1] Tamkang Univ, Dept Mech & Electromech Engn, Tamsui 25137, Taiwan
[2] CALTECH, Dept Elect Engn, Pasadena, CA 91125 USA
来源：
SENSORS AND ACTUATORS A-PHYSICAL | 2003年 / 103卷 / 1-2期
关键词：
gelatin; parylene; low temperature process; stiction;
D O I：
10.1016/S0924-4247(02)00338-2
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
This paper describes a newly developed low temperature photo-pattemable gelatin technology that is useful to produce a thick (>10 mum) gelatin protecting and strengthening layer for weak MEMS microstructures. Example demonstrated here is the gelatin process integrated with the parylene MEMS technology. The complete processing details and formulae are reported and allow anyone to use gelatin like photo-resist. We find that it is a chemical-resistant and mechanical-robust material for MEMS applications. (C) 2003 Elsevier Science B.V. All rights reserved.
引用
收藏
页码：284 / 290
页数：7
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