High-Q measurements of fused-silica microspheres in the near infrared

被引:410
作者
Vernooy, DW [1 ]
Ilchenko, VS
Mabuchi, H
Streed, EW
Kimble, HJ
机构
[1] CALTECH, Norman Bridge Lab Phys 12 33, Pasadena, CA 91125 USA
[2] Moscow MV Lomonosov State Univ, Dept Phys, Moscow 119899, Russia
关键词
D O I
10.1364/OL.23.000247
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
Measurements of the quality factor Q approximate to 8 x 10(9) are reported for the whispering-gallery modes (WGM's) of quartz microspheres for the wavelengths 670, 780, and 850 nm; these results correspond to finesse F approximate to 2.2 x 10(6). The observed independence of Q from wavelength indicates that losses for the WGM's are dominated by a mechanism other than bulk absorption in fused silica in the near infrared. Data obtained by atomic force microscopy combined with a simple model for surface scattering suggest that Q can be limited by residual surface inhomogeneities. Absorption by absorbed water can also explain why the material limit is not reached at longer wavelengths in the near infrared. (C) 1998 Optical Society of America.
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页码:247 / 249
页数:3
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