Chemical structure modification of silicone surfaces by plasma immersion ion implantation

被引：8

作者：

Husein, IF ^{[1
]}

Chan, C

Chu, PK

机构：

[1] Northeastern Univ, Dept Elect & Comp Engn, Plasma Sci & Microelect Lab, Boston, MA 02115 USA

[2] City Univ Hong Kong, Dept Phys & Mat Sci, Kowloon, Hong Kong, Peoples R China

来源：

JOURNAL OF MATERIALS SCIENCE LETTERS | 2000年 / 19卷 / 21期

关键词：

D O I：

10.1023/A:1006774308291

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The effect of modification of the chemical structure of silicone surfaces by Ar plasma immersion ion implantation (PIII) was investigated. The chemical composition and the nature of the chemical bonds were determined by the attenuated total reflectance Fourier transform infrared spectroscopy (FTIR-ATR) and by X-ray photoelectron spectroscopy (XPS) analysis. The bands in the FTIR spectrum of the PIII modified surface showed a decrease in their intensity. The XPS and the FTIR-ATR measurements suggested the formation of a ceramic-like layer on the Ar PIII-treated silicone surface.

引用

页码：1883 / 1885

页数：3

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