Advantages of Al-free GaInP/InGaAs PHEMTs for power applications

被引:9
作者
Chertouk, M
Burkner, S
Bachem, K
Pletschen, W
Kraus, S
Braunstein, J
Trankle, G
机构
[1] Fraunhofer Inst Angew Festkorperphys, D-79108 Freiburg, Germany
[2] Tech Univ Munich, Walter Schottky Inst, D-85748 Garching, Germany
关键词
D O I
10.1049/el:19980436
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The performance and temperature stability of Al-free GaInAs/GaAs PHEMTs with GaInP as a Schottky barrier is reported. GaInP/GaInAs/GaAs PHEMTs with a 1 mu m gate length show an f(max) value of 76 GHz with a maximum drain current of 570 mA/mm and a drain-source breakdown voltage of 16 V. Moreover, the first results on short gate length devices (0.15 mu m) yield f(T) and f(max) values of 106 and 203 GHz, respectively. In this case, the drain-source breakdown voltage is as high as 8 V. These results demonstrate the great potential of GaInP/GaInAs PHEMTs for power applications.
引用
收藏
页码:590 / 592
页数:3
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