4.5-and 8-keV emission and absorption x-ray imaging using spherically bent quartz 203 and 211 crystals (invited)

被引:93
作者
Koch, JA [1 ]
Aglitskiy, Y
Brown, C
Cowan, T
Freeman, R
Hatchett, S
Holland, G
Key, M
MacKinnon, A
Seely, J
Snavely, R
Stephens, R
机构
[1] Lawrence Livermore Natl Lab, Livermore, CA 94551 USA
[2] Sci Applicat Int Corp, Mclean, VA 22102 USA
[3] USN, Res Lab, Washington, DC 20375 USA
[4] Gen Atom Co, San Diego, CA 92186 USA
[5] Univ Calif Davis, Davis, CA 95616 USA
关键词
D O I
10.1063/1.1537448
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
We have used spherically-bent quartz 203 and 211 crystals to image 4.5- and 8-keV sources in both emission and absorption geometries. These imaging systems are straightforward to align, provide high throughput, and can provide high spatial resolution over large fields of view. We discuss the imaging geometry and alignment strategies, and we present experimental results we have obtained from a 1-ns-duration, multikilojoule laser facility and from sub-ps-duration, ultrahigh-intensity laser facilities. Our successful applications suggest that high-quality, spherically-bent quartz crystals may be used to image at many different x-ray energies due to the numerous diffraction planes available from quartz. This range of usable x-ray energies increases the number of applications that might benefit from high-resolution, high-brightness, monochromatic x-ray imaging using bent crystals. (C) 2003 American Institute of Physics.
引用
收藏
页码:2130 / 2135
页数:6
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