Molecular dynamics simulations of the chemical modification of polystyrene through CxFy+ beam deposition

被引:32
作者
Jang, IK [1 ]
Sinnott, SB [1 ]
机构
[1] Univ Florida, Dept Mat Sci & Engn, Gainesville, FL 32611 USA
关键词
D O I
10.1021/jp049283y
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The chemical modification of polystyrene through the deposition of a beam of polyatomic fluorocarbon ions (C3F5+ and CF3+) at experimental fluences is studied using classical molecular dynamics simulations with many-body empirical potentials. To facilitate these simulations, a new C-H-F potential is developed on the basis of the second-generation reactive empirical bond-order potential for hydrocarbons developed by Brenner. Lennard-Jones potentials are used to model long-range van der Waals interactions. The incident energy of the ion beam is 50 eV/ion, and it is deposited normal to the surface. The simulations illustrate the important differences in the chemical interactions of these polyatomic ions with the polystyrene. The CF3+ ions are predicted to be more effective at fluorinating the polystyrene than C3F5+ ions, and the dissociation of the C3F5+ ions produce long-lived precursors to fluorocarbon thin film nucleation.
引用
收藏
页码:18993 / 19001
页数:9
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