X-ray diffraction analysis of the defect structure in epitaxial GaN

被引:311
作者
Heinke, H [1 ]
Kirchner, V [1 ]
Einfeldt, S [1 ]
Hommel, D [1 ]
机构
[1] Univ Bremen, Inst Solid State Phys, D-28334 Bremen, Germany
关键词
D O I
10.1063/1.1314877
中图分类号
O59 [应用物理学];
学科分类号
摘要
High-resolution x-ray diffraction has been used to analyze the type and density of threading dislocations in (001)-oriented GaN epitaxial layers. For this, (00l) and (hkl) Bragg reflections with h or k nonzero were studied, the latter one measured in skew symmetric diffraction geometry. The defect analysis was applied to a variety of GaN layers grown by molecular-beam epitaxy under very different conditions. The outcome is a fundamental correlation between the densities of edge- and screw-type dislocations. (C) 2000 American Institute of Physics. [S0003-6951(00)02740-6].
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页码:2145 / 2147
页数:3
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