Photoconductivity of a-Si:H as a function of doping, temperature and photocarrier generation rates between 10(13) and 10(28)cm(-3)s(-1)

被引:2
作者
Stradins, P
Fritzsche, H
Kopidakis, N
Tzanetakis, P
机构
来源
AMORPHOUS SILICON TECHNOLOGY - 1996 | 1996年 / 420卷
关键词
D O I
10.1557/PROC-420-765
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The steady state photoconductivity sigma(p) of n-type, p-type and intrinsic a-Si:H has been studied up to photocarrier generation rates of G=5x10(27)cm(-3)s(-1). In the 20ppm B2H6/SiH4 p-type sample photoconduction switches from holes at low G to electrons at high G. The electron photoconduction at high G is increased by n-type and decreased by p-type doping. This is explained by the charge state of the dominant electron recombination centers. The sigma(p)(G) curves of doped and intrinsic a-Si:H merge at the highest G used.
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页码:765 / 770
页数:6
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