Ferroelectric Ba0.4Sr0.6TiO3 (BST) thin films grown on (001) MgO by pulsed laser deposition show a strong correlation between their structure and their microwave dielectric properties. Epitaxially grown BST films are observed by x-ray diffraction to be tetragonally distorted. The oxygen deposition pressure affects the magnitude of the tetragonal distortion (the ratio of in-plane and surface normal lattice parameters, D=a/c) of the deposited BST films. D varied from 0.996 to 1.004 at oxygen deposition pressure of 10-800 mTorr. The dielectric properties of BST films measured at microwave frequencies (1-20 GHz) exhibit an oxygen deposition pressure dependent dielectric constant (epsilon=100-600), and quality factor Q (1/tan delta=10-60). The BST film grown at the oxygen deposition pressure of 200 mTorr exhibits the highest figure of merit [% tuning in epsilon xQ(0V), where % tuning is 100x(epsilon(0)-epsilon(b))/epsilon(0), and epsilon(0) and epsilon(b) are dielectric constant at 0 and 80 kV/cm]. This corresponds to the film with the lowest distortion (D=1.001). The observed microwave properties of the films are explained by a phenomenological thermodynamic theory based on the strain along in-plane direction of the films. (C) 2000 American Institute of Physics. [S0021-8979(00)01022-7].
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George Washington Univ, Sch Engn & Appl Sci, Inst Sci Mat, Washington, DC 20052 USAGeorge Washington Univ, Sch Engn & Appl Sci, Inst Sci Mat, Washington, DC 20052 USA
Chang, WT
Gilmore, CM
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机构:George Washington Univ, Sch Engn & Appl Sci, Inst Sci Mat, Washington, DC 20052 USA
Gilmore, CM
Kim, WJ
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机构:George Washington Univ, Sch Engn & Appl Sci, Inst Sci Mat, Washington, DC 20052 USA
Kim, WJ
Pond, JM
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机构:George Washington Univ, Sch Engn & Appl Sci, Inst Sci Mat, Washington, DC 20052 USA
Pond, JM
Kirchoefer, SW
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机构:George Washington Univ, Sch Engn & Appl Sci, Inst Sci Mat, Washington, DC 20052 USA
Kirchoefer, SW
Qadri, SB
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机构:George Washington Univ, Sch Engn & Appl Sci, Inst Sci Mat, Washington, DC 20052 USA
Qadri, SB
Chirsey, DB
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机构:George Washington Univ, Sch Engn & Appl Sci, Inst Sci Mat, Washington, DC 20052 USA
Chirsey, DB
Horwitz, JS
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机构:George Washington Univ, Sch Engn & Appl Sci, Inst Sci Mat, Washington, DC 20052 USA
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George Washington Univ, Sch Engn & Appl Sci, Inst Sci Mat, Washington, DC 20052 USAGeorge Washington Univ, Sch Engn & Appl Sci, Inst Sci Mat, Washington, DC 20052 USA
Chang, WT
Gilmore, CM
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机构:George Washington Univ, Sch Engn & Appl Sci, Inst Sci Mat, Washington, DC 20052 USA
Gilmore, CM
Kim, WJ
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机构:George Washington Univ, Sch Engn & Appl Sci, Inst Sci Mat, Washington, DC 20052 USA
Kim, WJ
Pond, JM
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机构:George Washington Univ, Sch Engn & Appl Sci, Inst Sci Mat, Washington, DC 20052 USA
Pond, JM
Kirchoefer, SW
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机构:George Washington Univ, Sch Engn & Appl Sci, Inst Sci Mat, Washington, DC 20052 USA
Kirchoefer, SW
Qadri, SB
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机构:George Washington Univ, Sch Engn & Appl Sci, Inst Sci Mat, Washington, DC 20052 USA
Qadri, SB
Chirsey, DB
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机构:George Washington Univ, Sch Engn & Appl Sci, Inst Sci Mat, Washington, DC 20052 USA
Chirsey, DB
Horwitz, JS
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机构:George Washington Univ, Sch Engn & Appl Sci, Inst Sci Mat, Washington, DC 20052 USA