Chemical vapor deposition of carbon films: in-situ plasma diagnostics

被引：44

作者：

Obraztsov, AN

Zolotukhin, AA

Ustinov, AO

Volkov, AP

Svirko, YP

机构：

[1] Moscow MV Lomonosov State Univ, Dept Phys, Moscow 119992, Russia

[2] Univ Joensuu, Dept Phys, FIN-80101 Joensuu, Finland

来源：

CARBON | 2003年 / 41卷 / 04期

关键词：

diamond; graphitic carbon; carbon nanotubes; carbon/carbon composites; B plasma deposition;

D O I：

10.1016/S0008-6223(02)00402-5

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：836 / 839

页数：4

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[3] Electron field emission and structural properties of carbon chemically vapor-deposited films [J].

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[4] CVD growth and field emission properties of nanostructured carbon films [J].

Obraztsov, AN ;

Volkov, AP ;

Nagovitsyn, KS ;

Nishimura, K ;

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Nakano, Y ;

Hiraki, A .

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