Improved patterning quality of SU-8 microstructures by optimizing the exposure parameters

被引：58

作者：

Ling, ZG ^{[1
]}

Lian, K ^{[1
]}

Jian, LK ^{[1
]}

机构：

[1] Louisiana State Univ, Baton Rouge, LA 70806 USA

来源：

ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XVII, PTS 1 AND 2 | 2000年 / 3999卷

关键词：

resist processing; processing optimization; UV lithography; SU-8; absorption coefficient; dose;

D O I：

10.1117/12.388266

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

SU-8 has great potential in low cost ultra-thick high aspect ratio MEMS applications. Although a broad range of thickness (from mu m to mm) can be obtained by spin coating, the works about the sidewall profile and dimension control of SU-8 microstructures have not been published in detail. This paper describes the detailed investigations on the effects of processing parameters such as UV wavelength and exposure dose on dimensional change and sidewall profile of SU-8 microstructures. The optimized processing parameters for SU-8 structures with the thickness from 10 to 360 mu m are presented.

引用

页码：1019 / 1027

页数：3

共 10 条

[1] Combining microstereolithography and thick resist UV lithography for 3D microfabrication [J].

Bertsch, A ;

Lorenz, H ;

Renaud, P .

MICRO ELECTRO MECHANICAL SYSTEMS - IEEE ELEVENTH ANNUAL INTERNATIONAL WORKSHOP PROCEEDINGS, 1998, :18-23

[2]

CARTER WJ, COMMUNICATION

[3]

ELSHABINIRIAD A, 1998, THIN FILM TECHNOLOGY, P2

[4]

LABIANCA N, 1995, P SOC PHOTO-OPT INS, V2438, P846, DOI 10.1117/12.210413

[5] Micromachining applications of a high resolution ultrathick photoresist [J].

Lee, KY ;

LaBianca, N ;

Rishton, SA ;

Zolgharnain, S ;

Gelorme, JD ;

Shaw, J ;

Chang, THP .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1995, 13 (06) :3012-3016

[6] SU-8: a low-cost negative resist for MEMS [J].

Lorenz, H ;

Despont, M ;

Fahrni, N ;

LaBianca, N ;

Renaud, P ;

Vettiger, P .

JOURNAL OF MICROMECHANICS AND MICROENGINEERING, 1997, 7 (03) :121-124

[7] High-aspect-ratio, ultrathick, negative-tone near-UV photoresist and its applications for MEMS [J].

Lorenz, H ;

Despont, M ;

Fahrni, N ;

Brugger, J ;

Vettiger, P ;

Renaud, P .

SENSORS AND ACTUATORS A-PHYSICAL, 1998, 64 (01) :33-39

[8] Fabrication of photoplastic high-aspect ratio microparts and micromolds using SU-8 UV resist [J].

Lorenz, H ;

Despont, M ;

Vettiger, P ;

Renaud, P .

MICROSYSTEM TECHNOLOGIES, 1998, 4 (03) :143-146

[9]

THOMPSON LF, 1994, INTRO MICORLITHOGRAP, P161

[10]

SU8 PROCESS DATA MIC

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