Patterning of thin Poly(N-viny1 pyrrolidone) films on silicon substrates by electron beam lithography

被引:14
作者
Burkert, Sina
Schmidt, Thomas
Gohs, Uwe
Moench, Ingolf
Arndt, Karl-Friedrich [1 ]
机构
[1] Tech Univ Dresden, D-01062 Dresden, Germany
[2] Leibniz Inst Polymer Res Dresden, D-01069 Dresden, Germany
[3] IFW Dresden, Leibniz Inst Solid State & Mat Res Dresden, D-01069 Dresden, Germany
关键词
electron beam irradiation; lithography; hydrogels; thin films; swelling;
D O I
10.1002/app.26592
中图分类号
O63 [高分子化学(高聚物)];
学科分类号
070305 ; 080501 ; 081704 ;
摘要
Poly(N-vinyl pyrrolidone) (PVP) is a widely used biocompatible polymer. PVP can be crosslinked by electron beam irradiation even in dry state. In contact with water it forms hydrogels. In a previous work we analyzed the crosslinking behavior of PVP bulk gels and thin PVP films on silicon wafers under electron beam irradiation. In this work, we applied the electron beam lithography on dry PVP films. Different patterns with a width of less than 100 nm were written into the film with the e-beam of a scanning electron microscope. The topography of the patterned film is investigated by atomic force microscopy. For further applications, we tried to create a gradient of crosslinking density within the film using a combination of e-beam irradiation and e-beam lithography. (C) 2007 Wiley Periodicals, Inc.
引用
收藏
页码:534 / 539
页数:6
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