Mesoscale thermal infrared sources

被引：10

作者：

Giraud, SOC ^{[1
]}

Hasko, DG ^{[1
]}

机构：

[1] Univ Cambridge, Cavendish Lab, Microelect Res Ctr, Cambridge CB3 0HE, England

来源：

MICROELECTRONIC ENGINEERING | 1998年 / 42卷

关键词：

D O I：

10.1016/S0167-9317(98)00136-1

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

A thermally excited IR source, using an electrically excited array of free-standing wires, has been fabricated by a combination of e-beam lithography and reactive ion etching. The emitted radiation shows a reduced spectral bandwidth, compared to conventional blackbody sources, and the wavelength for which the intensity is a maximum is determined by the pitch and not by the temperature of the wires. This behaviour is a result of the size scale of the wires, where the wire width and pitch are much smaller than the wavelengths of the IR radiation emissions.

引用

页码：579 / 582

页数：4