Origin of definite Hall voltage and positive slope in mobility-donor density relation in disordered oxide semiconductors

被引:121
作者
Kamiya, Toshio [1 ,2 ]
Nomura, Kenji [2 ]
Hosono, Hideo [1 ,2 ,3 ]
机构
[1] Tokyo Inst Technol, Mat & Struct Lab, Midori Ku, Yokohama, Kanagawa 2268503, Japan
[2] Tokyo Inst Technol, Frontier Res Ctr, JST, ERATO SORST,Midori Ku, Yokohama, Kanagawa 2268503, Japan
[3] Tokyo Inst Technol, Frontier Res Ctr, Midori Ku, Yokohama, Kanagawa 2268503, Japan
关键词
amorphous semiconductors; electron mobility; gallium compounds; Hall mobility; hopping conduction; indium compounds; percolation; semiconductor epitaxial layers; weak localisation; ELECTRONIC-STRUCTURE; CARRIER TRANSPORT; CRYSTALLINE; CONDUCTION; SILICON; FILMS; SYSTEMS; GA;
D O I
10.1063/1.3364131
中图分类号
O59 [应用物理学];
学科分类号
摘要
Amorphous oxide semiconductors (AOSs) are expected for alternative channel materials in thin-film transistors owing to their large electron mobilities. While, it is known that AOSs exhibit peculiar electron transport properties. Definite Hall voltages are observed even for mobilities < 0.2 cm(2)/V s, which correspond to a very short mean free path (MFP) of 0.008 nm. Furthermore, Hall mobility increases with increasing the donor density. This paper reports that a percolation conduction model explains them; quantitative analyses based on the Boltzmann's transport theory prove that carriers within the potential barriers have large MFPs of 0.5-1 nm. The percolation model also explains variable-range-hoppinglike and weak-localizationlike behaviors.
引用
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页数:3
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