Low temperature polycrystalline silicon: a review on deposition, physical properties and solar cell applications

This review article gives a comprehensive compilation of recent developments in low temperature deposited poly Si films, also known as microcrystalline silicon. Important aspects such as the effect of ions and the frequency of the plasma ignition are discussed in relation to a high deposition rate and the desired crystallinity and structure. The development of various ion energy suppression techniques for plasma enhanced chemical vapour deposition and ionless depositions such as HWCVD and expanding thermal plasma, and their effect on the material and solar cell efficiencies are described. The recent understanding of several important physical properties, such as the type of electronic defects, structural effects on enhanced optical absorption, electronic transport and impurity incorporation are discussed. For optimum solar cell efficiency, structural considerations and predictions using computer modelling are analysed. A correlation between efficiency and the two most important process parameters, i.e., growth rate and process temperature is carried out. Finally, the application of these poly Si cells in multijunction cell structures and the best efficiencies worldwide by various deposition techniques are discussed. (C) 2002 Elsevier Science B.V. All rights reserved.