Extremely small AWG demultiplexer fabricated on InP by using a double-etch process

被引:70
作者
Barbarin, Y [1 ]
Leijtens, XJM [1 ]
Bente, EAJM [1 ]
Louzao, CM [1 ]
Kooiman, JR [1 ]
Smit, MK [1 ]
机构
[1] Tech Univ Eindhoven, COBRA, NL-5600 MB Eindhoven, Netherlands
关键词
arrayed waveguide grating (AWG); integrated optics; PHASAR; semiconductor waveguide; wavelength-division multiplexing;
D O I
10.1109/LPT.2004.835217
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A compact low-loss 4 x 4 arrayed waveguide grating (AWG) demultiplexer with a channel spacing of 400 GHz is presented. By employing a double-etch process, a low-loss device is made with deeply etched waveguides that have a bending radius down to 30 mum. This small radius and a reduction of the number of array arms, reduces the device size to only 230 x 330 mum(2). Measured insertion losses are less than 5 dB and the crosstalk is below -12 dB. To our knowledge, this is the smallest AWG reported to date.
引用
收藏
页码:2478 / 2480
页数:3
相关论文
共 7 条
[1]   Extremely small polarization independent phased-array demultiplexers on InP [J].
Bissessur, H ;
PagnodRossiaux, P ;
Mestric, R ;
Martin, B .
IEEE PHOTONICS TECHNOLOGY LETTERS, 1996, 8 (04) :554-556
[2]   SIMPLE EXTENSION TO THE FABRY-PEROT TECHNIQUE FOR ACCURATE MEASUREMENT OF LOSSES IN SEMICONDUCTOR WAVE-GUIDES [J].
CLARK, DF ;
IQBAL, MS .
OPTICS LETTERS, 1990, 15 (22) :1291-1293
[3]   A compact digitally tunable seven-channel ring laser [J].
den Besten, JH ;
Broeke, RG ;
van Geemert, M ;
Binsma, JJM ;
Heinrichsdorff, F ;
van Dongen, T ;
de Vries, T ;
Bente, EAJM ;
Leijtens, XJM ;
Smit, MK .
IEEE PHOTONICS TECHNOLOGY LETTERS, 2002, 14 (06) :753-755
[4]   Low-loss, compact, and polarization independent PHASAR demultiplexer fabricated by using a double-etch process [J].
den Besten, JH ;
Dessens, MP ;
Herben, CGP ;
Leijtens, XJM ;
Groen, FH ;
Leys, MR ;
Smit, MK .
IEEE PHOTONICS TECHNOLOGY LETTERS, 2002, 14 (01) :62-64
[5]  
HARMSMA PJ, 1999, INT PHOT RES IPR 99, P17
[6]   PHASAR-based WDM-devices: Principles, design and applications [J].
Smit, MK ;
vanDam, C .
IEEE JOURNAL OF SELECTED TOPICS IN QUANTUM ELECTRONICS, 1996, 2 (02) :236-250
[7]  
Zhu YC, 1999, ECIO'99: 9TH EUROPEAN CONFERENCE ON INTEGRATED OPTICS AND TECHNICAL EXHIBITION, P219