Direct-write planar microultracapacitors by laser engineering

被引:42
作者
Arnold, CB [1 ]
Wartena, RC
Swider-Lyons, KE
Piquea, A
机构
[1] USN, Res Lab, Div Mat Sci & Technol, Washington, DC 20375 USA
[2] USN, Res Lab, Div Chem, Washington, DC 20375 USA
关键词
D O I
10.1149/1.1563650
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
We have successfully employed laser direct write and micromachining to fabricate high capacity hydrous ruthenium oxide (RuOxHy or RuO2 . xH(2)O) microultracapacitors. A laser direct-write process is used to deposit uniform pads of RuO2 . 0.5H(2)O in sulfuric acid under ambient temperature and atmospheric conditions. Ultraviolet laser micromachining is used to tailor the shape and size of the deposited material into planar electrodes. The specific capacitance of the laser-deposited materials is comparable to reported values of similar to720 F/g. The microultracapacitors demonstrate linear charge and discharge behavior at currents below 1 mA, as expected for an ideal capacitor. By studying the charge storage and power output as a function of discharge current, the power can be successfully modeled assuming only simple ohmic losses. Parallel and series combinations of these microultracapacitor cells provide the expected addition of capacitance. Maximum discharge currents of 50 mA are applied to two cells in parallel without damage to the microultracapacitor cells. The microultracapacitors exhibit high specific power and specific energy with over 1100 mW/g at approximately 9 mWhr/g for an 80 mug cell with a footprint of 2 mm(2) and a thickness of 15 mm. (C) 2003 The Electrochemical Society.
引用
收藏
页码:A571 / A575
页数:5
相关论文
共 28 条
[1]  
Arnold CB, 2002, MATER RES SOC SYMP P, V698, P275
[2]   Direct writing of planar ultracapacitors by laser forward transfer processing [J].
Arnold, CB ;
Wartena, RC ;
Pratap, B ;
Swider-Lyons, KE ;
Piqué, A .
PHOTON PROCESSING IN MICROELECTRONICS AND PHOTONICS, 2002, 4637 :353-360
[3]   Thin-film lithium and lithium-ion batteries [J].
Bates, JB ;
Dudney, NJ ;
Neudecker, B ;
Ueda, A ;
Evans, CD .
SOLID STATE IONICS, 2000, 135 (1-4) :33-45
[4]   Ultracapacitors: why, how, and where is the technology [J].
Burke, A .
JOURNAL OF POWER SOURCES, 2000, 91 (01) :37-50
[5]   New approach to laser direct writing active and passive mesoscopic circuit elements [J].
Chrisey, DB ;
Pique, A ;
Fitz-Gerald, J ;
Auyeung, RCY ;
McGill, RA ;
Wu, HD ;
Duignan, M .
APPLIED SURFACE SCIENCE, 2000, 154 (154) :593-600
[6]   Theory of Ragone plots [J].
Christen, T ;
Carlen, MW .
JOURNAL OF POWER SOURCES, 2000, 91 (02) :210-216
[7]  
Conway B. E., 1999, ELECTROCHEMICAL SUPE, DOI DOI 10.1007/978-1-4757-3058-6
[8]  
DMOWSKI W, IN PRESS J PHYS CH B
[9]   Predictions of specific energies and specific powers of double-layer capacitors using a simplified model [J].
Dunn, D ;
Newman, J .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2000, 147 (03) :820-830
[10]   Ruthenium oxide film electrodes prepared at low temperatures for electrochemical capacitors [J].
Fang, QL ;
Evans, DA ;
Roberson, SL ;
Zheng, JP .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2001, 148 (08) :A833-A837