共 25 条
[2]
[5]
[7]
CHOI CH, 2006, PHYS REV LETT, V95
[9]
Impact of chemistry on profile control of resist masked silicon gates etched in high density halogen-based plasmas
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,
2003, 21 (05)
:2174-2183

