Mechanism of mark deformation in phase-change media tested in an accelerated environment

被引:2
作者
Hirotsune, Akemi
Terao, Motoyasu
Miyauchi, Yasushi
Tokushuku, Nobuhiro
Tamura, Reiji
机构
[1] Hitachi Ltd, Cent Res Lab, Kokubunji, Tokyo 1858601, Japan
[2] Hitachi Maxell Ltd, R&D Div, Dev & Technol Grp, Ibaraki 3002595, Japan
[3] Hitachi LG Data Storage Inc, Dev Div, Minato Ku, Tokyo 1080022, Japan
[4] Hitachi Maxwell Ltd, Opt Disc R&D Dept, Adv Disc Div, Ibaraki 3002595, Japan
关键词
D O I
10.1063/1.2718283
中图分类号
O59 [应用物理学];
学科分类号
摘要
Increased jitter caused by recording marks becoming deformed in an accelerated environmental test was investigated and a model where the change in the speed of crystallization is affected by passive oxidation on the amorphous surface of the recording layer was devised. The model clarified the mechanism by which deformation in the marks caused increased jitter in the accelerated environmental test. Adding nitrogen into the gas when sputtering the protective layer adjacent to the recording film was investigated. It was confirmed that a prototype disk with this protective layer has decreased jitter after a 500 h accelerated test and superior power margins. (c) 2007 American Institute of Physics.
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页数:9
相关论文
共 14 条
[1]   NEW DISK STRUCTURE FOR MILLION CYCLE OVERWRITABLE PHASE-CHANGE OPTICAL DISK [J].
AKIYAMA, T ;
YOSHIOKA, K ;
INOUE, K ;
ISOMURA, H ;
OHTA, T .
OPTICAL REVIEW, 1995, 2 (02) :100-102
[2]   Reliability of the phase change optical disk [J].
Hirota, K ;
Ohbayashi, G .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1997, 36 (10) :6398-6402
[3]  
HIROTSUNE A, 1998, 59 AUT M JAP SOC APP, V3, P1009
[4]  
KANDO H, 1998, MR9779 IEICE
[5]  
MASUMOTO K, 2003, STORY AMORPHOUS META, P60
[6]  
MINODA T, 1989, MAT TECHNOLOGY OPTIC, P117
[7]   Analysis of mark-formation process for phase-change media [J].
Miyamoto, M ;
Hirotsune, A ;
Miyauchi, Y ;
Ando, K ;
Terao, M ;
Tokusyuku, N ;
Tamura, R .
IEEE JOURNAL OF SELECTED TOPICS IN QUANTUM ELECTRONICS, 1998, 4 (05) :826-831
[8]  
MIYAUCHI Y, 1998, 45 SPRING M JAP SOC, V3, P1127
[9]  
OHTA R, 1990, P SOC PHOTO-OPT INS, V1316, P367
[10]  
PETROV II, 1968, SOV PHYS CRYSTALLOGR, V13, P339