Positive photosensitive polyimide synthesized by block-copolymerization for KrF lithography

被引：16

作者：

Itatani, T ^{[1
]}

Gorwadkar, S ^{[1
]}

Fukushima, T ^{[1
]}

Komuro, M ^{[1
]}

Itatani, H ^{[1
]}

Tomoi, M ^{[1
]}

Sakamoto, T ^{[1
]}

Matsumoto, S ^{[1
]}

机构：

[1] Electrotech Lab, Tsukuba, Ibaraki 3058568, Japan

来源：

ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XVII, PTS 1 AND 2 | 2000年 / 3999卷

关键词：

photosensitive; polyimide; KrF; block copolymerization; aliphatic ring;

D O I：

10.1117/12.388339

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

We have developed photosensitive polyimides synthesized by block-copolymerization for KrF lithography. The polyimides were synthesized from aliphatic tetracarboxylic dianhydrides and aliphatic diamines. Aliphatic rings have been introduced to reduce absorption at 248 nm(KrF). We have obtained line patterns of 0.17 mu m at a dose of 170 mJ/cm(2), and line and space patterns of 0.25 mu m at a dose of 190 mJ/cm(2).

引用

页码：552 / 558

页数：3