Fabrication of copper oxide multilayer nanosheets for supercapacitor application

被引：329

作者：

Dubal, D. P. ^{[1
]}

Dhawale, D. S. ^{[1
]}

Salunkhe, R. R. ^{[1
]}

Jamdade, V. S. ^{[1
]}

Lokhande, C. D. ^{[1
]}

机构：

[1] Shivaji Univ, Dept Phys, Thin Film Phys Lab, Kolhapur 416004, Maharashtra, India

来源：

JOURNAL OF ALLOYS AND COMPOUNDS | 2010年 / 492卷 / 1-2期

关键词：

Copper oxide; Thin films; Chemical deposition; Multilayer nanosheets; Supercapacitor; HYDROUS RUTHENIUM OXIDE; THIN-FILMS; ELECTRODE; DEPOSITION; BEHAVIOR; COBALT;

D O I：

10.1016/j.jallcom.2009.11.149

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070305 [高分子化学与物理];

摘要：

Copper oxide multilayer nanosheets thin films have been formed using simple and inexpensive chemical bath deposition (CBD) method. These films were characterized using X-ray diffraction (XRD), Field emission scanning electron microscope (FESEM), Fourier transform infrared spectrum (FTIR), optical absorption and wettability test. The XRD pattern revealed that the copper oxide films are amorphous. Formation of copper oxide compound was confirmed from the FUR studies. The FESEM images revealed the development of hierarchical multilayer nanosheets which covered the substrate surface. Surface wettability with liquid interface showed hydrophilic nature with water contact angle 53 degrees. The optical absorption showed existence of direct optical band gap of energy 2.18 eV. The supercapacitive properties of copper oxide thin film investigated in 1M Na2SO4 electrolyte showed supercapacitance of 43 F g(-1) at scan rate 10 mV s(-1). (C) 2009 Elsevier B.V. All rights reserved.

引用

页码：26 / 30

页数：5

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