High deposition rate parylene films

被引:33
作者
Yang, GR
Ganguli, S
Karcz, J
Gill, WN [1 ]
Lu, TM
机构
[1] Rensselaer Polytech Inst, Ctr Integrated Elect & Elect Mfg, Troy, NY 12180 USA
[2] Rensselaer Polytech Inst, Dept Phys, Troy, NY 12180 USA
[3] Rensselaer Polytech Inst, Dept Chem Engn, Troy, NY 12180 USA
关键词
D O I
10.1016/S0022-0248(97)00428-4
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
The deposition rate of polymeric parylene films is shown to be a sensitive function of temperature and pressure. By keeping the substrate temperature below room temperature, we obtain more than one order of magnitude higher deposition rates than those obtained at room temperature. It is suggested that the higher deposition rates are due to the increased condensation of the monomer on the surface during growth. These results are consistent with a physical-chemical model of the kinetics of polymer-film formation. (C) 1998 Published by Elsevier Science B.V. All rights reserved.
引用
收藏
页码:385 / 390
页数:6
相关论文
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