Electron stimulated desorption induced by the scanning tunneling microscope

被引:48
作者
Shen, TC [1 ]
Avouris, P [1 ]
机构
[1] IBM CORP, THOMAS J WATSON RES CTR, DIV RES, YORKTOWN HTS, NY 10598 USA
关键词
electron stimulated desorption (ESD); hydrogen; low index single crystal surfaces; scanning tunneling microscopy; silicon;
D O I
10.1016/S0039-6028(97)00506-2
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The use of the scanning tunneling microscope (STM) as an excitation source and a probe of electron stimulated desorption on the atomic scale is reviewed. The case of H desorption from H-terminated Si(001) is examined in detail. Experimental results on excitation thresholds, desorption cross-sections, isotope effects and site-selectivities are presented. Evidence for mechanisms involving direct electronic and hot ground-state desorption, as well as a novel multiple-vibrational excitation mechanism is discussed. Using the latter mechanism, the ultimate resolution limit of selective single atom desorption is achieved. New results on desorption from Si dihydride, including a proposed mechanism for the STM-induced H/Si(001)-3x1 to 2x1 conversion, are presented. Possible applications of STM-induced desorption in nanofabrication are considered. (C) 1997 Elsevier Science B.V.
引用
收藏
页码:35 / 44
页数:10
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