A photolithographic process for fabrication of devices with isolated single-walled carbon nanotubes

被引：29

作者：

Tselev, A ^{[1
]}

Hatton, K

Fuhrer, MS

Paranjape, M

Barbara, P

机构：

[1] Georgetown Univ, Dept Phys, Washington, DC 20057 USA

[2] Univ Maryland, Dept Phys, College Pk, MD 20742 USA

[3] Univ Maryland, Ctr Supercond Res, College Pk, MD 20742 USA

来源：

NANOTECHNOLOGY | 2004年 / 15卷 / 11期

关键词：

D O I：

10.1088/0957-4484/15/11/017

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

We have successfully fabricated devices with isolated single-walled carbon nanotubes (SWNTs) using exclusively standard i-line (365 nm) photolithography. Catalyst islands were patterned with an SU-8-photoresist-based process. This method provides well-defined islands, down to I am in size. The islands are clearly visible with an optical microscope and are used as alignment marks for optical alignment of subsequent layers. SWNTs were grown by chemical vapour deposition (CVD). Contacts to the nanotubes were fabricated by standard photolithography.

引用

页码：1475 / 1478

页数：4

共 8 条

[1] Carbon nanotube actuators [J].