Deep-ultraviolet contact photolithography

被引：16

作者：

Goodberlet, JG ^{[1
]}

Dunn, BL ^{[1
]}

机构：

[1] MIT, Elect Res Lab, Cambridge, MA 02139 USA

来源：

MICROELECTRONIC ENGINEERING | 2000年 / 53卷 / 1-4期

关键词：

D O I：

10.1016/S0167-9317(00)00272-0

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

The patterning of 100 nm features via contact photolithography is described. Details of a conformable embedded-amplitude mask and pattern transfer into a tri-layer resist with this mask are presented. In-plane pattern-placement errors for this lithographic process have been measured to be less than 60 nm.

引用

收藏

页码：95 / 99

页数：5

相关论文

共 8 条

[1] Nanolithography using optical contact exposure in the evanescent near field [J].

Blaikie, RJ ;

Alkaisi, MM ;

McNab, SJ ;

Cumming, DRS ;

Cheung, R ;

Hasko, DG .

MICROELECTRONIC ENGINEERING, 1999, 46 (1-4) :85-88

[2] IMPRINT OF SUB-25 NM VIAS AND TRENCHES IN POLYMERS [J].

CHOU, SY ;

KRAUSS, PR ;

RENSTROM, PJ .

APPLIED PHYSICS LETTERS, 1995, 67 (21) :3114-3116

[3] FEATURES OF GOLD HAVING MICROMETER TO CENTIMETER DIMENSIONS CAN BE FORMED THROUGH A COMBINATION OF STAMPING WITH AN ELASTOMERIC STAMP AND AN ALKANETHIOL INK FOLLOWED BY CHEMICAL ETCHING [J].

KUMAR, A ;

WHITESIDES, GM .

APPLIED PHYSICS LETTERS, 1993, 63 (14) :2002-2004

[4]

LEVENSON MD, COMMUNICATION

[5] Application of interferometric broadband imaging alignment on an experimental x-ray stepper [J].

Moon, EE ;

Lee, J ;

Everett, PN ;

Smith, HI .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1998, 16 (06) :3631-3636

[6] Quantifying distortions in soft lithography [J].

Rogers, JA ;

Paul, KE ;

Whitesides, GM .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1998, 16 (01) :88-97

[7] Light-coupling masks: An alternative, lensless approach to high-resolution optical contact lithography [J].

Schmid, H ;

Biebuyck, H ;

Michel, B ;

Martin, OJF ;

Piller, NB .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1998, 16 (06) :3422-3425

[8] METHOD FOR FABRICATING HIGH FREQUENCY SURFACE WAVE TRANSDUCERS [J].

SMITH, HI .

REVIEW OF SCIENTIFIC INSTRUMENTS, 1969, 40 (05) :729-&