Influence of oxidation conditions on the properties of indium oxide thin films

被引:61
作者
Girtan, M [1 ]
Rusu, GI [1 ]
Rusu, GG [1 ]
Gurlui, S [1 ]
机构
[1] Univ Iasi, Fac Phys, Solid State Dept, R-6600 Iasi, Romania
关键词
semiconductor; indium oxide; thermal oxidation velocity; optical transmission; electrical conduction;
D O I
10.1016/S0169-4332(00)00238-5
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Indium oxide (In2O3) thin films have been prepared by thermal evaporation of indium in vacuum on a glass substrate at room temperature, followed by thermal oxidation in air. It was experimentally established that the heating velocity during the oxidation process has a strong influence on the electrical and optical properties of films as prepared. The temperature was increased from room temperature to 450 degrees C, with velocities ranging between 0.1 degrees C/s and 0.5 degrees C/s. In2O3 thin films as obtained have been examined for optical transparency function on wavelength. The calculated values of optical band gap range between 2.99 and 3.31 eV. Electrical conductivity measurements have also been carried out on the above oxide thin films as a function of temperature. Both the electrical and optical studies showed that In2O3 thin films with higher transparency and electrical conductivity are obtained at higher oxidation velocities. Also, the experimental results show linear dependences of transmission coefficient on the oxidation velocity. (C) 2000 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:492 / 498
页数:7
相关论文
共 18 条
[1]   THIN-LAYERS DEPOSITED BY THE PYROSOL PROCESS [J].
BLANDENET, G ;
COURT, M ;
LAGARDE, Y .
THIN SOLID FILMS, 1981, 77 (1-3) :81-90
[2]   TRANSPARENT CONDUCTORS - A STATUS REVIEW [J].
CHOPRA, KL ;
MAJOR, S ;
PANDYA, DK .
THIN SOLID FILMS, 1983, 102 (01) :1-46
[3]  
CHOPRA KL, 1969, THIN FILM PHENOMENA, P102
[4]  
Damodara Das V., 1996, J APPL PHYS, V79, P8521
[5]   Large area deposition of ITO films by cluster type sputtering system [J].
Ishibashi, K ;
Watabe, K ;
Hosokawa, N .
THIN SOLID FILMS, 1996, 281 :198-201
[6]   ORIGIN OF CHARACTERISTIC GRAIN-SUBGRAIN STRUCTURE OF TIN-DOPED INDIUM OXIDE-FILMS [J].
KAMEI, M ;
SHIGESATO, Y ;
TAKAKI, S .
THIN SOLID FILMS, 1995, 259 (01) :38-45
[7]  
KIREEV PS, 1977, SCI ENCICLOPEDICA, P706
[8]   EFFECT OF ANNEALING ON THE SURFACE AND INTERFACE PROPERTIES OF INDIUM OXIDE SILICON STRUCTURES [J].
KOLLURI, SV ;
CHANDORKAR, AN .
THIN SOLID FILMS, 1993, 230 (01) :39-44
[9]   HIGH-EFFICIENCY INDIUM TIN OXIDE INDIUM-PHOSPHIDE SOLAR-CELLS [J].
LI, X ;
WANLASS, MW ;
GESSERT, TA ;
EMERY, KA ;
COUTTS, TJ .
APPLIED PHYSICS LETTERS, 1989, 54 (26) :2674-2676
[10]   ACTIVATED REACTIVE EVAPORATION OF A TRANSPARENT CONDUCTIVE COATING FOR THE IR REGION [J].
LUBEZKY, I ;
MARCOVITCH, O ;
KLEIN, Z ;
ZIPIN, H .
THIN SOLID FILMS, 1987, 148 (01) :83-92