High-resolution XAS spectrum of interstitial nitrogen molecules in the surface oxide matrix of TiAlN film

被引:17
作者
Esaka, F
Shimada, H
Imamura, M
Matsubayashi, N
Kikuchi, T
Furuya, K
机构
[1] Sci Univ Tokyo, Fac Sci, Dept Appl Chem, Shinjuku Ku, Tokyo 162, Japan
[2] Natl Inst Mat & Chem Res, Tsukuba, Ibaraki 305, Japan
[3] Sci Univ Tokyo, Onoda, Yamaguchi 756, Japan
关键词
XAS; XPS; TiAlN; nitrogen molecule; electronic interaction;
D O I
10.1016/S0368-2048(97)00215-6
中图分类号
O433 [光谱学];
学科分类号
0703 ; 070302 ;
摘要
High-resolution X-ray absorption spectroscopy (XAS) has been applied to the study of the electronic interaction of interstitial N-2 molecules with the surface oxide matrix of an oxidized TiAlN film. The N pi* feature of the interstitial N-2 molecules has displayed evident vibrational fine structure, on which the full width at half maximum lifetime width (Gamma) and vibrational separation (omega(e)) have been calculated. The comparison of the Gamma value with that of gaseous phase N-2 molecules has shown that the pi* orbital of the N-2 molecules has a very weak electronic interaction with the orbitals of the matrix. In addition, the change in the omega(e) value has suggested that the N-N bonding of the N-2 molecules is strengthened due to the stress by the surrounding matrix. (C) 1998 Elsevier Science B.V.
引用
收藏
页码:817 / 820
页数:4
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