Work function response of thin gold film surfaces to phosphine and arsine

被引:13
作者
Chung, YS
Evans, K
Glaunsinger, W
机构
[1] Motorola Inc, Semicond Prod Sector, Phoenix, AZ 85008 USA
[2] Arizona State Univ, Dept Chem & Biochem, Tempe, AZ 85287 USA
关键词
D O I
10.1016/S0169-4332(97)00243-2
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The work function changes of thin gold films upon exposure to phosphine and arsine in the concentration range 20-80 parts per billion (ppb) concentrations were studied using the Kelvin probe method under ambient conditions. The work function of gold surfaces decreases significantly in the presence of these gases. This decrease is attributed to charge transfer from these hydride molecules to the gold surface through sigma-bonding of their lone-pair electrons. Auger electron spectroscopy and secondary ion mass spectrometry were used to characterize the surface chemical components of thin gold films. The extraordinarily high sub-ppb sensitivity of the work function response for phosphine and arsine on gold surfaces under ambient conditions can be used to detect ultra-trace concentration of these toxic gases. (C) 1998 Elsevier Science B.V.
引用
收藏
页码:65 / 72
页数:8
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