Accuracy potential of circular laser writing of DOEs

被引：12

作者：

Cherkashin, VV ^{[1
]}

Kharissov, AA ^{[1
]}

Korol'kov, VP ^{[1
]}

Koronkevich, VP ^{[1
]}

Poleshchuk, AG ^{[1
]}

机构：

[1] Russian Acad Sci, Inst Automat & Electrometry, Siberian Branch, Novosibirsk 630090, Russia

来源：

COMPUTER AND HOLOGRAPHIC OPTICS AND IMAGE PROCESSING | 1998年 / 3348卷

关键词：

laser writing; laser beam lithography; diffractive optics; computer generated holograms; manufacturing of zone plates; optical testing;

D O I：

10.1117/12.302509

中图分类号：

TP18 [人工智能理论];

学科分类号：

081104 ; 0812 ; 0835 ; 1405 ;

摘要：

The circular laser writing system for writing of arbitrary patterns of diffractive elements in chromium films and photoresists has been developed as an alternative method for laser or e-beam writing in x-y system of coordinates. This system is able to generate binary amplitude and continuos-tone patterns with features of less then 1 mu m and accuracy of 0.1 mu m on substrates up to 300 mm diameter. Construction of the circular laser writing system (CLWS) designed at the IA&E and writing strategies such as laser beam addressing in polar coordinate system are described. This article presents the overview and analysis of writing errors. The characteristics of zone plates and linear gratings fabrication and methods of errors measurement are given. The measurements of wavefront errors of binary f/1.1 zone plates and linear polar system gratings with period of less then 5 mu m fabricated by CLWS demonstrate the high quality of writing strategy.

引用

页码：58 / 68

页数：11