Phase-separation-induced surface patterns in thin polymer blend films

被引：233

作者：

Karim, A ^{[1
]}

Slawecki, TM

Kumar, SK

Douglas, JF

Satija, SK

Han, CC

Russell, TP

Liu, Y

Overney, R

Sokolov, O

Rafailovich, MH

机构：

[1] Natl Inst Stand & Technol, Gaithersburg, MD 20899 USA

[2] Penn State Univ, Dept Mat Sci & Engn, University Pk, PA 16802 USA

[3] Univ Massachusetts, Dept Polymer Sci & Engn, Amherst, MA 01003 USA

[4] SUNY Stony Brook, Dept Mat Sci, Stony Brook, NY 11790 USA

[5] Univ Washington, Dept Chem Engn, Seattle, WA 98195 USA

来源：

MACROMOLECULES | 1998年 / 31卷 / 03期

关键词：

D O I：

10.1021/ma970687g

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

Atomic force microscopy (AFM), neutron reflection (NR) and secondary ion mass spectroscopy (SIMS) are used to examine phase separation in symmetrically segregating thin polymer blend films (less than or equal to 1000 Angstrom). Phase separation in the film leads to undulations of the liquid-air interface, provided the film is sufficiently thin to suppress surface-directed spinodal decomposition waves. Flattened droplets are formed at a very late stage of phase separation, and the aspect ratio of these droplets can be rationalized by an interfacial free energy minimization argument.

引用

页码：857 / 862

页数：6

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