Surface modification of TiO2 film by iron doping using reactive magnetron sputtering

被引：70

作者：

Zhang, WJ ^{[1
]}

Li, Y ^{[1
]}

Zhu, SL ^{[1
]}

Wang, FH ^{[1
]}

机构：

[1] Chinese Acad Sci, Inst Met Res, State Key Lab Corros & Protect, Shenyang 110016, Peoples R China

来源：

CHEMICAL PHYSICS LETTERS | 2003年 / 373卷 / 3-4期

基金：

中国国家自然科学基金;

关键词：

D O I：

10.1016/S0009-2614(03)00618-3

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Fe-doped TiO2 films are prepared by pulse de reactive magnetron sputtering. Iron concentration is controlled by varying the surface area of Fe pieces fixed on the pure titanium target. TiO2 films are in anatase phase when iron concentration is less than 10 at.%. Only Ti(IV) is found in the pure TiO2 film while Fe-doped TiO2 films show mixed titanium oxidation states. The absorption edges of Fe-doped TiO2 films show red shift. The films with low iron concentrations perform better photocatalytic activity than the pure TiO2 film and the best doped iron concentration is 0.58 at.%. (C) 2003 Elsevier Science B.V. All rights reserved.

引用

页码：333 / 337

页数：5

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