Electromigration of vacancies in copper

被引：21

作者：

Hoekstra, J

Sutton, AP

Todorov, TN

Horsfield, AP

机构：

[1] Univ Oxford, Dept Mat, Oxford OX1 3PH, England

[2] Queens Univ Belfast, Sch Math & Phys, Belfast BT7 1NN, Antrim, North Ireland

[3] FECIT, Uxbridge UB11 1AB, Middx, England

来源：

PHYSICAL REVIEW B | 2000年 / 62卷 / 13期

关键词：

D O I：

10.1103/PhysRevB.62.8568

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The total current-induced force on atoms in a Cu wire containing a vacancy are calculated using the self consistent one-electron density matrix in the presence of an electric current, without separation into electron-wind and direct forces. By integrating the total current-induced force, the change in vacancy migration energy due to the current is calculated. We use the change in migration energy with current to infer an effective electromigration driving force F-e. Finally, we calculate the proportionality constant rho* between F-e and the current density in the wire.

引用

页码：8568 / 8571

页数：4

共 37 条

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[2] Theoretical study of the electromigration wind force for adatom migration at metal surfaces [J].