Computational aspects of the local iterative Monte Carlo technique

被引:3
作者
Jakumeit, J [1 ]
机构
[1] GMD, German Natl Res Ctr Informat Technol, Inst Algorithm & Sci Comp, D-53754 Sankt Augustin, Germany
来源
INTERNATIONAL JOURNAL OF MODERN PHYSICS C | 2000年 / 11卷 / 04期
关键词
Monte Carlo; semiconductor devices; parallel computation;
D O I
10.1142/S0129183100000584
中图分类号
TP39 [计算机的应用];
学科分类号
081203 ; 0835 ;
摘要
Lately, the Local Iterative Monte Carlo technique was introduced for an efficient simulation of effects connected to sparsely populated regions in semiconductor devices like hot electron effects in silicon MOSFETs. This paper focuses on computational aspects of this new Monte Carlo technique, namely the reduction of the computation time by parallel computation and the reuse of drift information. The Local Iterative Monte Carlo technique combines short Monte Carlo particle flight simulations with an iteration process to a complete device simulation. The separation between short Monte Carlo simulations and the iteration process makes a simple parallelization strategy possible. The necessary data transfer is small and can be performed via the Network File System. An almost linear speed up could be achieved. Besides by parallelization, the computational expenses can be significantly reduced, when the results of the short Monte Carlo simulations are memorized in a drift table and used several times. A comparison between a bulk, a one-dimensional and the two-dimensional Local Iterative Monte Carlo simulation reveals that by using the drift information more than once, becomes increasingly efficient with increasing dimension of the simulation.
引用
收藏
页码:665 / 673
页数:9
相关论文
共 13 条
[1]   Full-band Monte Carlo investigation of hot carrier trends in the scaling of metal-oxide-semiconductor field-effect transistors [J].
Duncan, A ;
Ravaioli, U ;
Jakumeit, J .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1998, 45 (04) :867-876
[2]   MONTE-CARLO DETERMINATION OF ELECTRON TRANSPORT PROPERTIES IN GALLIUM ARSENIDE [J].
FAWCETT, W ;
BOARDMAN, AD ;
SWAIN, S .
JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1970, 31 (09) :1963-&
[3]  
Hess K., 1991, Monte Carlo Device Simulation: Full Band and Beyond
[4]  
Jacoboni C., 1989, The Monte Carlo method for semiconductor device simulation, V1st, DOI DOI 10.1007/978-3-7091-6963-6
[5]  
Jakumeit J, 1997, PHYS STATUS SOLIDI B, V204, P517, DOI 10.1002/1521-3951(199711)204:1<517::AID-PSSB517>3.0.CO
[6]  
2-R
[7]   Calculation of hot electron distributions in silicon by means of an evolutionary algorithm [J].
Jakumeit, J ;
Ravaioli, U ;
Hess, K .
JOURNAL OF APPLIED PHYSICS, 1996, 80 (09) :5061-5066
[8]  
JAKUMEIT J, P IWCE 6 OS JAP, P92
[9]  
JAKUMEIT J, UNPUB IEEE T ED
[10]  
JUNGEMANN C, IEEE T SEMICONDUCT T