Effect of adsorption of anions on the kinetics of the copper adatom layer formation at polycrystalline platinum

被引：16

作者：

Danilov, AI ^{[1
]}

Molodkina, EB ^{[1
]}

Polukarov, YM ^{[1
]}

机构：

[1] Russian Acad Sci, Inst Phys Chem, Moscow 117915, Russia

来源：

RUSSIAN JOURNAL OF ELECTROCHEMISTRY | 2000年 / 36卷 / 09期

基金：

俄罗斯基础研究基金会;

关键词：

D O I：

10.1007/BF02757511

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

The formation of copper adatom layers at polycrystalline platinum in sulfate and perchlorate solutions is studied by cyclic voltammetry on a ring-disk electrode. Specific adsorption of anions accelerates the copper underpotential deposition by decreasing the positive potential of the dense part of EDL. Of importance is the anion composition of co-adsorption lattices that form at moderate coverages of platinum by copper. Supermonolayer coatings form under the conditions of strong specific adsorption of anions. Tn a weakly acid sodium sulfate solution, the surface coverage by copper adatoms reaches 1.7 monolayers.

引用

页码：976 / 986

页数：11

共 67 条

[1] EFFECT OF UNDERPOTENTIAL DEPOSITION (UPD) OF COPPER ON OXYGEN REDUCTION AT PT(111) SURFACES [J].

ABE, T ;

SWAIN, GM ;

SASHIKATA, K ;

ITAYA, K .

JOURNAL OF ELECTROANALYTICAL CHEMISTRY, 1995, 382 (1-2) :73-83

[2] Anion and electrode surface structure effects on the deposition of metal monolayers: electrochemical and time-resolved surface diffraction studies [J].

Abruna, HD ;

Feliu, JM ;

Brock, JD ;

Buller, LJ ;

Herrero, E ;

Li, J ;

Gomez, R ;

Finnefrock, A .

ELECTROCHIMICA ACTA, 1998, 43 (19-20) :2899-2909

[3]

ADZIC RR, 1984, ADV ELECTROCH EL ENG, V13, P159

[4]

ARAMATA A, 1997, MOD ASPECT ELECTROC, V31, P181

[5] UNDERPOTENTIAL DEPOSITION OF CU ON AU(111) - IMPLICATIONS OF THE HB MODEL [J].

BLUM, L ;

HUCKABY, DA .

JOURNAL OF ELECTROANALYTICAL CHEMISTRY, 1994, 375 (1-2) :69-77

[6] POTENTIAL-DEPENDENT STRUCTURAL-CHANGES OF UNDERPOTENTIALLY DEPOSITED COPPER ON AN IODINE-TREATED PLATINUM SURFACE DETERMINED IN-SITU BY SURFACE EXAFS AND ITS POLARIZATION DEPENDENCE [J].

BOMMARITO, GM ;

ACEVEDO, D ;

RODRIGUEZ, JF ;

ABRUNA, HD .

JOURNAL OF ELECTROANALYTICAL CHEMISTRY, 1994, 379 (1-2) :135-150

[7] ROTATING RING-DISK STUDY OF UNDERPOTENTIAL DEPOSITION OF COPPER AT PLATINUM IN 0.5M HYDROCHLORIC ACID [J].

CADLE, SH ;

BRUCKENSTEIN, S .

ANALYTICAL CHEMISTRY, 1971, 43 (07) :932-+

[8] INHIBITION OF HYDROGEN ADSORPTION BY SUBMONOLAYER DEPOSITION OF METALS ON PLATINUM [J].

CADLE, SH ;

BRUCKENS.S .

ANALYTICAL CHEMISTRY, 1971, 43 (13) :1858-&

[9] ELECTROCHEMICAL STUDY OF THE INITIAL SURFACE CONDITION OF PLATINUM SURFACES WITH (100) AND (111) ORIENTATIONS [J].

CLAVILIER, J ;

ARMAND, D ;

WU, BL .

JOURNAL OF ELECTROANALYTICAL CHEMISTRY, 1982, 135 (01) :159-166

[10]

DAMASKIN BB, 1983, VVEDENIE ELEKTROKHIM

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