Correlation between DLTS and photoluminescence in he-implanted 6H-SiC

被引:18
作者
Frank, T
Pensl, G
Bai, S
Devaty, RP
Choyke, WJ
机构
[1] Univ Erlangen Nurnberg, Inst Appl Phys, DE-91058 Erlangen, Germany
[2] Univ Pittsburgh, Dept Phys & Astron, Pittsburgh, PA 15260 USA
来源
SILICON CARBIDE AND RELATED MATERIALS - 1999 PTS, 1 & 2 | 2000年 / 338-3卷
关键词
DLTS; implantation-induced defects; LTPL;
D O I
10.4028/www.scientific.net/MSF.338-342.753
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
6H-SiC samples were He+-implanted with different fluences and annealed at different temperatures (700 degreesC to 1700 degreesC) to generate intrinsic-related defect centers. Deep level transient spectroscopy (DLTS) and low temperature photoluminescence (LTPL) investigations were conducted on identical samples. The correlation of corresponding peak heights (defect concentrations) in DLTS and LTPL spectra as a function of the implanted He+ fluence and of the annealing temperature leads to the conclusion that the E-1/E-2-center observed in DLTS spectra and the D-I defect (L-v,-lines, v=1, 2, 3) observed in LTPL spectra are caused by the same defect center. A corresponding identity could be established for the Z(1)/Z(2)-center (DLTS) and the defect which is responsible for the PL line at 4349 Angstrom.
引用
收藏
页码:753 / 756
页数:4
相关论文
共 7 条
  • [1] BIERSACK JP, FORTRAN MONTE CARLO
  • [2] Choyke W. J., 1977, International Conference on Radiation Effects in Semiconductors, P58
  • [3] Dalibor T, 1996, INST PHYS CONF SER, V142, P517
  • [4] Dalibor T, 1997, PHYS STATUS SOLIDI A, V162, P199, DOI 10.1002/1521-396X(199707)162:1<199::AID-PSSA199>3.0.CO
  • [5] 2-0
  • [6] Observation of negative-U centers in 6H silicon carbide
    Hemmingsson, CG
    Son, NT
    Janzén, E
    [J]. APPLIED PHYSICS LETTERS, 1999, 74 (06) : 839 - 841
  • [7] Negative-U centers in 4H silicon carbide
    Hemmingsson, CG
    Son, NT
    Ellison, A
    Zhang, J
    Janzen, E
    [J]. PHYSICAL REVIEW B, 1998, 58 (16) : 10119 - 10122