The influence of the photoelectron elastic scattering on the photoelectron diffraction patterns, in-depth profiling and thin film thickness determination

The previously obtained analytical expressions for the account for the elastic photoelectron scattering are checked by Monte-Carlo calculations and experimental data. The in-depth profiling correction factors, intensities in a layered system and diffraction patterns are considered. A simple analytical expression connecting the overlayer thickness and the change in diffraction patterns is proposed. (C) 1998 Elsevier Science B.V.