An XPS study of carbon nitride synthesized by ion beam nitridation of C60 fullerene

被引:56
作者
Ripalda, JM [1 ]
Montero, I
Galan, L
机构
[1] UAM, Dept Fis Aplicada, Madrid 28049, Spain
[2] UAM, Inst Ciencia Mat, Madrid 28049, Spain
关键词
C3N4; nitrogen; ion implantation; electron spectroscopy;
D O I
10.1016/S0925-9635(97)00228-8
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Carbon nitride thin films were obtained using low-energy nitrogen ion beams (0.05-3.0 keV) and simultaneous sublimation of fullerene (C-60) on Si substrates. By comparing the N 1s peak positions with reference data on nitrogen containing polymers and organic molecules, it is shown that the two main components of the N 1s spectra at 400.6 and 398.5 eV correspond to nitrogen bonded to sp(2) and sp(3) carbon, respectively. It is also suggested that a third component related to ion beam-induced defects should be considered in an intermediate position (399.3 eV). This component disappears at temperatures above 500 K and reappears when the annealed samples are bombarded with Ar+ ions (1.0 keV), C 1s core level spectra do not show discrete chemical shifts but an overlapping distribution producing a broad line shape, whose centroid shifts to higher binding energies with increasing nitrogen content. The samples were determined to be amorphous by X-ray diffraction and Infrared Absorption Spectroscopy. (C) 1998 Elsevier Science S.A.
引用
收藏
页码:402 / 406
页数:5
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