Electrochemical adsorption of rhodium on platinum

被引：24

作者：

Bakos, I ^{[1
]}

Szabó, S ^{[1
]}

机构：

[1] Hungarian Acad Sci, Chem Res Ctr, Inst Chem, H-1525 Budapest, Hungary

来源：

JOURNAL OF ELECTROANALYTICAL CHEMISTRY | 2003年 / 547卷 / 01期

基金：

匈牙利科学研究基金会;

关键词：

rhodium; platinum; adsorption; underpotential deposition;

D O I：

10.1016/S0022-0728(03)00173-6

中图分类号：

O65 [分析化学];

学科分类号：

070302 ; 081704 ;

摘要：

Electrosorption of rhodium on a polycrystalline platinum surface has been studied. It has been found that a complete Rh-coverage can be obtained by spontaneous adsorption via the ionization of preadsorbed hydrogen. Underpotential deposition of rhodium has been observed both in 0.5 M H2SO4 and 0.2 M HCl supporting electrolytes. The value of the underpotential shift was found to be about 100-120 mV. (C) 2003 Elsevier Science B.V. All rights reserved.

引用

页码：103 / 107

页数：5

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