Evidence of repulsive interactions between NO, O, and N on Ir(110). A fast x-ray photoelectron spectroscopy study

被引:16
作者
de Wolf, CA
Bakker, JW
Wouda, PT
Nieuwenhuys, BE
Baraldi, A
Lizzit, S
Kiskinova, M
机构
[1] Leiden Univ, Leiden Inst Chem, NL-2300 RA Leiden, Netherlands
[2] Sincrotrone Trieste, I-34012 Basovizza, Italy
关键词
D O I
10.1063/1.1323727
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The adsorption of NO on Ir(110) was studied in the temperature range from 200 to 500 K with fast x-ray photoelectron spectroscopy (XPS) using synchrotron radiation. Only three surface species were observed: molecular NO, atomic O, and atomic N. NO dissociation starts at temperatures higher than 300 K and molecular NO can coadsorb with O-ads in the whole temperature region studied. By collecting O 1s and N 1s spectra within a few seconds we obtained information on the interaction between N-ads, O-ads, and NOads with increasing coadsorbate coverage. The N-ads-O-ads interaction has been found to be strongly repulsive. As a consequence, the N-ads is destabilized already at moderate coverages and temperatures above 350 K leading to the removal of N-ads from the surface in the form of N-2 desorption. (C) 2000 American Institute of Physics. [S0021-9606(00)70547-2].
引用
收藏
页码:10717 / 10722
页数:6
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