Comment on "Pulsed laser deposition and properties of Mn+1AXx phase formulated Ti3SiC2 thin films''

被引：12

作者：

Eklund, P ^{[1
]}

Palmquist, JP

Wilhelmsson, O

Jansson, U

Emmerlich, J

Högberg, H

Hultman, L

机构：

[1] Linkoping Univ, IFM, Dept Phys, Thin Film Phys Div, SE-58183 Linkoping, Sweden

[2] Uppsala Univ, Dept Chem Mat, Angstrom Lab, SE-75121 Uppsala, Sweden

来源：

TRIBOLOGY LETTERS | 2004年 / 17卷 / 04期

关键词：

Ti3SiC2; MAX phase; titanium carbide; thin films; pulsed laser deposition; X-ray diffraction; transmission electron microscopy;

D O I：

10.1007/s11249-004-8112-y

中图分类号：

TQ [化学工业];

学科分类号：

0817 ;

摘要：

A recent paper by Hu et al. claimed synthesis of the MAX-phase Ti3SiC2 at 100 - 300 degreesC using pulsed laser deposition. In this comment, we find that the evidence presented by Hu et al. is insufficient to show Ti3SiC2 formation. In fact, there is a simpler interpretation of their results from X-ray diffraction and transmission electron microscopy, namely that the material produced is a cubic TiC-based compound.

引用

页码：977 / 978

页数：2

共 17 条

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