GaN/InGaN quantum wells grown in a close coupled showerhead reactor

被引:6
作者
Thrush, EJ
Kappers, MJ
Dawson, P
Vickers, ME
Barnard, J
Graham, D
Makaronidis, G
Rayment, FDG
Considine, L
Humphreys, CJ
机构
[1] Thomas Swan Sci Equipment Ltd, Cambridge CB4 4FQ, England
[2] Univ Cambridge, Dept Mat Sci & Met, Cambridge CB2 3QZ, England
[3] UMIST, Dept Phys, Manchester M60 1QD, Lancs, England
关键词
photoluminescence; X-ray diffraction; metalorganic vapor phase deposition; quantum wells; nitrides;
D O I
10.1016/S0022-0248(02)01929-2
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
Alternative regimes for the growth of GaN/InGaN quantum wells in a close coupled showerhead reactor have been investigated and their respective merits discussed. State-of-the-art characteristics have been seen from the best structures using 300 and 6 K photoluminescence, high-resolution X-ray diffraction. atomic force microscopy and transmission electron microscopy to characterize the material, The fabrication of high-quality electroluminescent devices from selected structures has shown the practical relevance of these studies, (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:518 / 522
页数:5
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