On the relation between microstructure and electrochemical reactivity of sputtered amorphous carbon nitride electrodes

被引：16

作者：

Lagrini, A.

Charvet, S.

Benlahsen, M.

Cachet, H.

Deslouis, C.

机构：

[1] Fac Sci Amiens, UPRES, EA 2081, Phys Mat Condensee Lab, F-80039 Amiens 1, France

[2] Univ Paris 06, CNRS, UPR 15, LISE, F-75252 Paris 5, France

来源：

DIAMOND AND RELATED MATERIALS | 2007年 / 16卷 / 4-7期

关键词：

electrodes; carbon nitride; electrochemical reactivity; local microstructure;

D O I：

10.1016/j.diamond.2007.01.006

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Spectroscopic investigations on carbon nitride thin films (a-CNx) deposited by radio-frequency (RF) magnetron sputtering on (100) silicon and titanium wafers, under different RF powers, are reported. The local bonding in the a-CTx films was analyzed by X-ray photoelectron spectroscopy (XPS) measurements, Fourier transform infrared (FTIR) and Raman spectroscopies. These experiments were completed by dark electrical conductivity measurements, performed at room temperature in coplanar configuration, electrochemical impedance spectroscopy (EIS) and by scanning electrochemical microscopy (SECM). A good correlation is observed between the local microstructure and the electrochemical behaviours, such as high capacity and stable cyclability of the deposited electrodes of the deposited a-CNx films at different nitrogen partial pressures. (C) 2007 Elsevier B.V. All rights reserved.

引用

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页码：1378 / 1382

页数：5

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