Hydrogen adsorption states at the Pd/SiO2 interface and simulation of the response of a Pd metal-oxide-semiconductor hydrogen sensor

被引:51
作者
Eriksson, M [1 ]
Ekedahl, LG [1 ]
机构
[1] Linkoping Univ, Dept Phys & Measurement Technol, S-58183 Linkoping, Sweden
关键词
D O I
10.1063/1.367150
中图分类号
O59 [应用物理学];
学科分类号
摘要
The response of a Pd-SiO2-Si hydrogen sensor depends on the reaction kinetics of hydrogen on the Pd surface and on the hydrogen adsorption states at the Pd/SiO2 interface. In this work we show that besides the dominating hydrogen adsorption state located on the oxide side of the interface, a second state, resulting in opposite hydrogen polarization, exists. This state is possibly a reminiscence of the hydrogen adsorption state on a clean Pd surface. Taking both states into account, a simulation of the hydrogen response over more than ten decades in hydrogen pressures gives good agreement with published data. (C) 1998 American Institute of Physics.
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页码:3947 / 3951
页数:5
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