Field emission conduction mechanisms in chemical vapor deposited diamond and diamondlike carbon films

被引:63
作者
May, PW
Hohn, S
Wang, WN
Fox, NA
机构
[1] Univ Bristol, Sch Chem, Bristol BS8 1TS, Avon, England
[2] Univ Bristol, Dept Phys, Bristol BS8 1TR, Avon, England
关键词
D O I
10.1063/1.121315
中图分类号
O59 [应用物理学];
学科分类号
摘要
Field emission properties of undoped chemical vapor deposited diamond and diamondlike carbon films have been measured for a variety of different deposition conditions. The nature and appearance of the damage site after testing, together with the mathematical form of the observed current-voltage relations, are correlated with the conductivity of the film. This is consistent with a model for the overall current which is a combination of conduction mechanisms through the bulk of the film with Fowler-Nordheim tunneling. (C) 1998 American Institute of Physics.
引用
收藏
页码:2182 / 2184
页数:3
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