Dose distribution of synchrotron x-ray penetrating materials of low atomic numbers

被引:19
作者
Cheng, Y
Kuo, NY
Su, CH
机构
[1] Synchrt. Radiation Research Center, Science-Based Industrial Park, Hsinchu 30077, No. 1, R and D VI Road
关键词
D O I
10.1063/1.1148067
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
This article describes the distribution of absorption doses and spectrum shift of synchrotron x-ray traversing materials. The analytical approximations of the universal function of the synchrotron power spectrum was found. From this analytical approach, the penetration doses and the high-pass window effect were estimated for materials of low atomic numbers. The result can be generally applied to the deep x-ray lithography. (C) 1997 American Institute of Physics.
引用
收藏
页码:2163 / 2166
页数:4
相关论文
共 7 条
  • [1] ACHE HJ, 1995, SENSORS, V8, P79
  • [2] GRBOMAN WD, 1983, HDB SYNCHROTRON RA B, V1, P1131
  • [3] X-RAY INTERACTIONS - PHOTOABSORPTION, SCATTERING, TRANSMISSION, AND REFLECTION AT E=50-30,000 EV, Z=1-92
    HENKE, BL
    GULLIKSON, EM
    DAVIS, JC
    [J]. ATOMIC DATA AND NUCLEAR DATA TABLES, 1993, 54 (02) : 181 - 342
  • [4] KRINSKY S, 1983, HDB SYNCHROTRON RA A, V1, P65
  • [5] LIU YC, 1994, EPAC C P LOND 27 JUN, P110
  • [6] Michette A.G., 1986, OPTICAL SYSTEMS SOFT
  • [7] PETZOLD HC, 1989, APPL SYNCHROTRON RAD, P277